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Proceedings Paper

End-of-line metrology: a new lithographic tool with applications to lens, OPC, and process characterization
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Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, ; doi: 10.1117/12.993160
Show Author Affiliations
Pierre Leroux, VLSI Technology, Inc. (United States)
David H. Ziger, VLSI Technology, Inc. (United States)
Noris Juig, VLSI Technology, Inc. (United States)
Satyendra S. Sethi, VLSI Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 3332:
Metrology, Inspection, and Process Control for Microlithography XII
Bhanwar Singh, Editor(s)

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