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Proceedings Paper

Improving the photoresist profile for 0.45-um metal layer lithography
Author(s): Thian Teck Ong; Chung Yih Lee; Wei Wen Ma
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Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, ; doi: 10.1117/12.992127
Show Author Affiliations
Thian Teck Ong, Chartered Semiconductor Manufacturing Ltd. (Singapore)
Chung Yih Lee, Chartered Semiconductor Manufacturing Ltd. (Singapore)
Wei Wen Ma, Chartered Semiconductor Manufacturing Ltd. (Singapore)


Published in SPIE Proceedings Vol. 3183:
Microlithographic Techniques in IC Fabrication

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