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Proceedings Paper

Relationship between overall exposure and diffraction efficiency n photopolymer
Author(s): Changgui Li; Cunlin Zhang; WenHui Mei; Lidong Li; Weidong Yang; Yongyuan Yang
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Proc. SPIE 2885, Holographic Optical Elements and Displays, ; doi: 10.1117/12.990119
Show Author Affiliations
Changgui Li, Beijing Institute of Technology (China)
Cunlin Zhang, Beijing Institute of Technology (China)
WenHui Mei, Beijing Institute of Technology (United States)
Lidong Li, Institute of Photographic Chemistry (China)
Weidong Yang, Institute of Photographic Chemistry (China)
Yongyuan Yang, Institute of Photographic Chemistry (China)


Published in SPIE Proceedings Vol. 2885:
Holographic Optical Elements and Displays
Freddie Shing-Hong Lin; Daxiong Xu, Editor(s)

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