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Proceedings Paper

Usage of electrically controlled photomask for dry microlithography by femtosecond visible laser pulses
Author(s): Moishe S. Kitai
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Paper Details

Date Published:
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, ; doi: 10.1117/12.989371
Show Author Affiliations
Moishe S. Kitai, Research Ctr. for Technological Lasers (United States)

Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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