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Proceedings Paper

High-efficiency point diffraction interferometer for EUV optics testing
Author(s): Hector Medecki; Edita Tejnil; Kenneth A. Goldberg; Raul Berguiristain; Jeffrey Bokor
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Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, ; doi: 10.1117/12.989055
Show Author Affiliations
Hector Medecki, Lawrence Berkeley National Lab. (United States)
Edita Tejnil, Univ. of California/Berkeley (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Raul Berguiristain, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Jeffrey Bokor, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 2723:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
David E. Seeger, Editor(s)

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