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Proceedings Paper

Novel three-phase phase-shifting mask for nonperiodic patterns
Author(s): Yohko Iwabuchi; Yukio Ogura; Hiroyoshi Tanabe; Shinji Ishida; Naoaki Aizaki; Shunji Kishida
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Paper Details

Date Published:
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Proc. SPIE 1927, Optical/Laser Microlithography, ; doi: 10.1117/12.984215
Show Author Affiliations
Yohko Iwabuchi, NEC Corp. (Japan)
Yukio Ogura, NEC Corp. (Japan)
Hiroyoshi Tanabe, NEC Corp. (Japan)
Shinji Ishida, NEC Corp. (Japan)
Naoaki Aizaki, NEC Corp. (Japan)
Shunji Kishida, NEC Corp. (Japan)


Published in SPIE Proceedings Vol. 1927:
Optical/Laser Microlithography
John D. Cuthbert, Editor(s)

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