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Proceedings Paper

Linewidth metrology for replicated x-ray masks using back-scattered electron microscopy
Author(s): Michael T. Reilly; Quinn J. Leonard; Franco Cerrina; Enzo M. Di Fabrizio; Massimo Gentili; Laura Luciani
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Date Published:
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Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, ; doi: 10.1117/12.984202
Show Author Affiliations
Michael T. Reilly, Univ. of Wisconsin/Madison (United States)
Quinn J. Leonard, Univ. of Wisconsin/Madison (United States)
Franco Cerrina, Univ. of Wisconsin/Madison (United States)
Enzo M. Di Fabrizio, CNR-IESS (Italy)
Massimo Gentili, CNR-IESS (Italy)
Laura Luciani, CNR-IESS (Italy)


Published in SPIE Proceedings Vol. 1924:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
David O. Patterson, Editor(s)

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