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Proceedings Paper

Design of planar lightwave interleavers based on Echelle gratings structure
Author(s): Wenkai Liu; Baoqun Li; Xiaowei Dong
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Paper Abstract

This paper reports the design procedure of planar lightwave interleavers based on Echelle gratings structure, introduces two methods to eliminate the device aberration, two-point aberration-free design and elliptical grating facets design. Simulation results show that the device insertion loss and crosstalk can be effectively reduced by aberration compensation design. Design example is given in this paper. The 50/100GHz and 100/200GHz interleavers are fabricated on the SOI (Silicon-on-insulator) materials. As compared to other solutions, they are smaller and compact in structure.

Paper Details

Date Published: 27 November 2012
PDF: 7 pages
Proc. SPIE 8555, Optoelectronic Devices and Integration IV, 855524 (27 November 2012); doi: 10.1117/12.981789
Show Author Affiliations
Wenkai Liu, North China Univ. of Technology (China)
Baoqun Li, North China Univ. of Technology (China)
Xiaowei Dong, North China Univ. of Technology (China)


Published in SPIE Proceedings Vol. 8555:
Optoelectronic Devices and Integration IV
Xuping Zhang; Hai Ming; Joel M. Therrien, Editor(s)

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