Share Email Print
cover

Proceedings Paper

In situ aberration measurement technique based on quadratic Zernike model
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A novel technique (AMAI-Quad) for aberration extraction of lithographic projection based on quadratic relationship model between aerial-image intensity distribution and Zernike coefficients is proposed. Zernike coefficients in this case represent the imaging quality of lithographic projection lens in a semiconductor wafer exposure scanner. The proposed method uses principal component analysis and multivariate linear regression analysis for model generation. This quadratic model is then used to extract Zernike coefficients by nonlinear least-squares. Compared with earlier techniques, based on a linear relationship between Zernike coefficients and aerial images, proposed by Duan, the new method can extend the types of aberrations measured. The application of AMAI-Quad to computed images of lithography simulators PROLITH and Dr.LiTHO for randomly varied wavefront aberrations within a range of 50mλ demonstrated an accuracy improvement of 30%.

Paper Details

Date Published: 18 December 2012
PDF: 13 pages
Proc. SPIE 8550, Optical Systems Design 2012, 85503O (18 December 2012); doi: 10.1117/12.981328
Show Author Affiliations
Jishuo Yang, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Sikun Li, Shanghai Institute of Optics and Fine Mechanics (China)
Lifeng Duan, Shanghai Microelectronics Equipment Co., Ltd. (China)
Guanyong Yan, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Dongbo Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Anatoly Y. Bourov, Shanghai Micro Electronics Equipment Co., Ltd. (China)
Andreas Erdmann, Fraunhofer-Institut für Integrierte System und Bauelementetechnologie (Germany)


Published in SPIE Proceedings Vol. 8550:
Optical Systems Design 2012
Laurent Mazuray; Rolf Wartmann; Andrew P. Wood; Marta C. de la Fuente; Jean-Luc M. Tissot; Jeffrey M. Raynor; Daniel G. Smith; Frank Wyrowski; Andreas Erdmann; Tina E. Kidger; Stuart David; Pablo Benítez, Editor(s)

© SPIE. Terms of Use
Back to Top