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Proceedings Paper

Transform designs to chips, an end user point of view on mask making
Author(s): John Y. Chen
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Paper Abstract

Mask is a tool required to replicate a set of complicated IC geometries numerous times producing chips in large volume. It is absolutely crucial to achieve high quality mask in accuracy and perfection. This paper focuses on technology needs which challenge mask-making capabilities including data preparation and Optical Proximity Correction (OPC), Critical Dimension (CD) / Line Edge Roughness (LER) control, alignment and defect elimination. The impact of lithography and mask making on the design and manufacturing of new products is discussed from an end user perspective. The paper emphasizes performance, precision and perfection and the necessity of the three p’s for the continuation of Moore’s law.

Paper Details

Date Published: 8 November 2012
PDF: 4 pages
Proc. SPIE 8522, Photomask Technology 2012, 852202 (8 November 2012); doi: 10.1117/12.981267
Show Author Affiliations
John Y. Chen, NVIDIA Corp. (United States)

Published in SPIE Proceedings Vol. 8522:
Photomask Technology 2012
Frank E. Abboud; Thomas B. Faure, Editor(s)

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