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Proceedings Paper

Planar plano-convex microlens in silica using ICP-CVD and DRIE
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Paper Abstract

A microlens suitable for integration with photonic elements on the same substrate is presented. It is fabricated utilizing planar standard technologies such as UV lithography, ICP-CVD and Deep Reactive Ion Etching. For reaching an optical 3D functionality with 2 D structuring methods a variation of the refractive index during the layer deposition process in the vertical direction is used. For the horizontal direction, parallel to the substrate, the shape of etched side walls determines the focus. This procedure allows the independent control of light propagation in two perpendicular directions with planar technologies. To demonstrate the potential of the technology, optical elements for the collimation of fiber-based light sources are presented.

Paper Details

Date Published: 18 December 2012
PDF: 7 pages
Proc. SPIE 8550, Optical Systems Design 2012, 85500T (18 December 2012); doi: 10.1117/12.981266
Show Author Affiliations
E. Markweg, Technische Univ. Ilmenau (Germany)
M. Hillenbrand, Technische Univ. Ilmenau (Germany)
S. Sinzinger, Technische Univ. Ilmenau (Germany)
M. Hoffmann, Technische Univ. Ilmenau (Germany)


Published in SPIE Proceedings Vol. 8550:
Optical Systems Design 2012
Laurent Mazuray; Daniel G. Smith; Jean-Luc M. Tissot; Tina E. Kidger; Frank Wyrowski; Stuart David; Rolf Wartmann; Jeffrey M. Raynor; Andrew P. Wood; Pablo Benítez; Andreas Erdmann; Marta C. de la Fuente, Editor(s)

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