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Proceedings Paper

High numerical aperture silicon collimating lens for mid-infrared quantum cascade lasers manufactured using wafer-level techniques
Author(s): Eric Logean; Lubos Hvozdara; Joab Di-Francesco; Hans Peter Herzig; Reinhard Voelkel; Martin Eisner; Pierre-Yves Baroni; Michel Rochat; Antoine Müller
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Paper Abstract

We present an aspheric collimating lens for mid-infrared (4-14 μm) quantum cascade lasers. The lenses were etched into silicon by an inductively coupled plasma reactive ion etching system on wafer level. The high refractive index of silicon reduces the height of the lens profile resulting in a simple element working at high numerical aperture (up to 0.82). Wafer level processes enable the fabrication of about 5000 lenses in parallel. Such cost-effective collimating lens is a step towards the adoption of quantum cascade lasers for all its potential applications.

Paper Details

Date Published: 18 December 2012
PDF: 6 pages
Proc. SPIE 8550, Optical Systems Design 2012, 85500Q (18 December 2012); doi: 10.1117/12.981165
Show Author Affiliations
Eric Logean, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Lubos Hvozdara, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Joab Di-Francesco, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Hans Peter Herzig, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Reinhard Voelkel, SUSS MicroOptics SA (Switzerland)
Martin Eisner, SUSS MicroOptics SA (Switzerland)
Pierre-Yves Baroni, Alpes Lasers SA (Switzerland)
Michel Rochat, Alpes Lasers SA (Switzerland)
Antoine Müller, Alpes Lasers SA (Switzerland)


Published in SPIE Proceedings Vol. 8550:
Optical Systems Design 2012
Laurent Mazuray; Rolf Wartmann; Andrew P. Wood; Marta C. de la Fuente; Jean-Luc M. Tissot; Jeffrey M. Raynor; Daniel G. Smith; Frank Wyrowski; Andreas Erdmann; Tina E. Kidger; Stuart David; Pablo Benítez, Editor(s)

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