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Investigation of the x-ray reflectivity of the Co/Mo2C system upon thermal treatment
Author(s): Yanyan Yuan; Karine Le Guen; Jean-Michel André; Zhanshan Wang; Haochuan Li; Jingtao Zhu; Philippe Jonnard
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Paper Abstract

The Co-based multilayers have been shown promising optical mirrors for application in the EUV and soft x-ray ranges. Most multilayer systems cannot attain the reflectivity and resolution requirements assumed by theory because of interdiffusion and roughness. Therefore, it is necessary to find out the excellent material possessing optical performance in the EUV and soft x-ray ranges and propose solution to eliminate the interface imperfections or find out new efficient combinations. Here we propose a new system, namely the periodic Co/Mo2C multilayer. The multilayer systems are prepared by the magnetron sputtering and characterized by x-ray reflectivity at 8048 eV (Cu Kα emission) and with synchrotron radiation in the soft x-ray range at 778 eV. The measurements are used in order to determine the structural parameters (thickness, roughness and density) of the layers. The simulated reflectivity at 11° grazing angle with s-polarized is calculated to be 45% at 778 eV, if there is no interaction between the layers and no interfacial roughness, while experimentally reflectivity is limited to 25%. The relationship between the reflectivity and annealing up to a temperature of 600°C is also investigated. It shows that the Co/Mo2C multilayer is able to work up to 600°C. First the reflectivity increases to 27% at 300°C. After the reflectivity slightly decreases to 25% at 500°C and then we observe a reflectivity drop to 20% at 600°C. Relationship between the structural parameters and the reflectivity values is deduced from the fit of the experimental curves.

Paper Details

Date Published: 18 December 2012
PDF: 6 pages
Proc. SPIE 8550, Optical Systems Design 2012, 85501U (18 December 2012); doi: 10.1117/12.980895
Show Author Affiliations
Yanyan Yuan, Univ. Pierre et Marie Curie (France)
Karine Le Guen, Univ. Pierre et Marie Curie (France)
Jean-Michel André, Univ. Pierre et Marie Curie (France)
Zhanshan Wang, Tongji Univ. (China)
Haochuan Li, Tongji Univ. (China)
Jingtao Zhu, Tongji Univ. (China)
Philippe Jonnard, Univ. Pierre et Marie Curie (France)

Published in SPIE Proceedings Vol. 8550:
Optical Systems Design 2012
Laurent Mazuray; Daniel G. Smith; Jean-Luc M. Tissot; Tina E. Kidger; Frank Wyrowski; Stuart David; Rolf Wartmann; Jeffrey M. Raynor; Andrew P. Wood; Pablo Benítez; Andreas Erdmann; Marta C. de la Fuente, Editor(s)

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