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Proceedings Paper

Analysis of the output irradiance uniformity of integrating sphere source
Author(s): Yingwei He; Ping Li; Houping Wu; Cheng Li; Limin Xiong; Haifeng Meng; Dingpu Liu; Jieyu Zhang; Junchao Zhang
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Paper Abstract

Regarding to the mistakes that optoelectronic devices such as CCD focal plane arrays devices are often placed on the exit port plane of integrating sphere source to perform calibration, the output irradiance uniformity of integrating sphere source is analyzed, the basis which rational using the integrating sphere source to calibrate the optoelectronic devices is obtained. Two theoretical output irradiance uniformity models based on numerical analysis method and Monte Carlo method are developed respectively. The models consider two fundamental situations of integrating sphere sources, namely (1) ideal lambertian source and (2) non-ideal lambertian source. The distribution regularity of irradiance uniformity was generalized by contrast of the theoretical data obtained by the models and the measured data obtained by two different actual integrating sphere sources. The results show that when (1) the diameter of optoelectronic device is less than half diameter of the sphere exit port, and (2)the ratio of the distance from device to exit port and the exit port diameter are between 3 and 5, a 99% better output irradiance uniformity can be obtained. The results provide a practical guide to ensure the accuracy of the calibration exercise of optoelectronic devices.

Paper Details

Date Published: 15 October 2012
PDF: 10 pages
Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 841729 (15 October 2012); doi: 10.1117/12.978690
Show Author Affiliations
Yingwei He, National Institute of Metrology (China)
Ping Li, National Institute of Metrology (China)
Houping Wu, National Institute of Metrology (China)
Cheng Li, National Institute of Metrology (China)
Limin Xiong, National Institute of Metrology (China)
Haifeng Meng, National Institute of Metrology (China)
Dingpu Liu, National Institute of Metrology (China)
Jieyu Zhang, National Institute of Metrology (China)
Junchao Zhang, National Institute of Metrology (China)


Published in SPIE Proceedings Vol. 8417:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Libin Xiang; Sandy To, Editor(s)

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