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Proceedings Paper

The Cross Talk of Multi-errors Impact on Lithography Performance and the Method of Its Control
Author(s): Yanqiu Li; Chunying Han; Xuejia Guo; Lihui Liu; Xuxia Wang; Jianhong Yang
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Paper Abstract

As semiconductor feature sizes continue to shrink, the allowable error margins for Critical Dimension (CD) is getting increasingly tight. However multiple errors are inherent in the lithography system which could have severe impact on CD control and process latitude. It is indispensable to analyze and balance the influences of various errors in order to get larger tolerance for errors within allowable error margins for CD. In this paper, by using PROLITHTM X3 and in-house software IntLitho, we study the cross-talk of the dominative errors of numerical aperture, coherent factors, mask CD, flare and analyze its influence on lithography performance. The results show that the tolerance for the errors can be released when some errors impact on CD is counterpoised by that arising from another error in usable process window. Moreover multiple combinations of errors or tolerances can be used for such compensations. Finally we supply a method to perform the compensation of multi errors impact on CD and process window, which is the essence of co-design or cooptimization of lithography tool for rigorous CD control.

Paper Details

Date Published: 15 October 2012
PDF: 11 pages
Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 841802 (15 October 2012); doi: 10.1117/12.978295
Show Author Affiliations
Yanqiu Li, Beijing Institute of Technology (China)
Chunying Han, Beijing Institute of Technology (China)
Xuejia Guo, Beijing Institute of Technology (China)
Lihui Liu, Beijing Institute of Technology (China)
Xuxia Wang, Beijing Institute of Technology (China)
Jianhong Yang, Beijing Univ. of Technology (China)


Published in SPIE Proceedings Vol. 8418:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems
Tianchun Ye; Xiangang Luo; Xiaoyi Bao; Song Hu; Yanqiu Li, Editor(s)

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