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Proceedings Paper

Effect of wet chemical treatment on BK-7 substrate
Author(s): Xiaowen Ye; Tao Ding; Xinbin Cheng; Bin Ma; Zhengxiang Shen; Jinlong Zhang; Huasong Liu; Yiqin Ji; Zhanshan Wang
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Paper Abstract

Surface cleanness and roughness to BK-7 substrates are important factors affecting the performance of laser optics. The conventional RCA cleaning method is widely used in removing particles from substrate surface, with high removal efficiency but rough surface. Therefore, more precise control of the chemical cleaning performance of BK-7 substrate is required than what is available today. In this study, four groups of BK-7 samples were dealt with different cleaning treatments to explore the effects of chemical solutions. The influences of chemical solutions on removal efficiency, etching depth and surface roughness were studied. An optimal cleaning method of BK-7 substrates was proposed, which could remove contaminations completely and gets smoother surface.

Paper Details

Date Published: 15 October 2012
PDF: 8 pages
Proc. SPIE 8420, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing, 84201L (15 October 2012); doi: 10.1117/12.978283
Show Author Affiliations
Xiaowen Ye, Tongji Univ. (China)
Tao Ding, Tongji Univ. (China)
Xinbin Cheng, Tongji Univ. (China)
Bin Ma, Tongji Univ. (China)
Zhengxiang Shen, Tongji Univ. (China)
Jinlong Zhang, Tongji Univ. (China)
Huasong Liu, Jinhang Institute of Technology Physics (China)
Yiqin Ji, Jinhang Institute of Technology Physics (China)
Zhanshan Wang, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 8420:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing
Xiangdi Lin; Yoshiharu Namba; Tingwen Xing, Editor(s)

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