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Proceedings Paper

Radical and Molecular Product Concentration Measurements in CF4 RF Plasmas by Infrared Tunable Diode Laser Absorption RF plasmas by infrared tunable diode laser absorption
Author(s): J. Wormhoudt
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Paper Abstract

Absolute concentration measurements of radicals and stable molecules formed in radio frequency plasmas were performed by infrared tunable diode laser absorption in a laboratory reactor which allows a long absorption path. In this paper we report studies of CF4 RF plasmas. We report CF2, CF4, and C2F6 concentrations in CF4 plasmas as functions of total pressure, RF power, and oxygen addition.

Paper Details

Date Published: 30 January 1990
PDF: 14 pages
Proc. SPIE 1185, Dry Processing for Submicrometer Lithography, (30 January 1990); doi: 10.1117/12.978064
Show Author Affiliations
J. Wormhoudt, Aerodyne Research, Inc. (United States)

Published in SPIE Proceedings Vol. 1185:
Dry Processing for Submicrometer Lithography
James A. Bondur; Alan R. Reinberg, Editor(s)

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