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Proceedings Paper

Effect of pulse duration on laser induced damage threshold of multilayer dielectric gratings
Author(s): Fanyu Kong; Yunxia Jin; Dawei Li; Weixiao Chen; Meiping Zhu; Tao Wang; Chaoyang Li; Hongbo He; Guang Xu; Jianda Shao
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Paper Abstract

Multilayer dielectric gratings (MDGs) are more and more used to compress pulse in the next generation of chirped-pulse amplification (CPA) system for high-energy petawatt (HEPW)-class lasers due to their high efficiency and high damage threshold for picosecond pulses. The damage tests for MDGs were carried out with long pulse (12ns) in air and short pulse (0.66~9.7ps) in vacuum at 1053nm, respectively. The experiment methodologies and results were discussed. For both long and short pulse, the initial damage locates at the grating ridges opposite to the incoming wave, which is consistent with the maximum normalized electric field intensity (NEFI). For long pulse, the damage is characterized by melting and boiling. And for short pulse, the damage is ascribed to multiphoton-induced avalanche ionization because of the electric field enhancement in the grating groove structure. And Measurement results of the dependence of damage threshold on the pulse width are presented. And the damage threshold of MDG in beam normal is 4.4J/cm2 at 70° incidence angle for 9.7ps pulse.

Paper Details

Date Published: 4 December 2012
PDF: 9 pages
Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85300L (4 December 2012); doi: 10.1117/12.977339
Show Author Affiliations
Fanyu Kong, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Yunxia Jin, Shanghai Institute of Optics and Fine Mechanics (China)
Dawei Li, Shanghai Institute of Laser Plasma (China)
Shanghai Institute of Laser Plasma (China)
Weixiao Chen, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Meiping Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Tao Wang, Shanghai Institute of Laser Plasma (China)
Chaoyang Li, Shanghai Institute of Laser Plasma (China)
Hongbo He, Shanghai Institute of Optics and Fine Mechanics (China)
Guang Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 8530:
Laser-Induced Damage in Optical Materials: 2012
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M J Soileau, Editor(s)

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