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Proceedings Paper

Nanostructure photolithography based on surface plasmonic interference
Author(s): Wei Xiao; Chinhua Wang; Genhua Chen; Fuyang Xu; Yimin Lou; Bing Cao; Guiju Zhang
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Paper Abstract

In this paper, we present a novel photolithographic technique to achieve variable 1D or 2D nanostructural patterns using a fixed 2-D metallic phase mask based on surface plasmonic interference. With different polarizing orientations of the incident light and a diffraction-limited phase mask which is formed by a metallic square array with a large period, surface plasmons (SPs) interferometric parttens with resolutions beyond diffraction limit can be obtained. The effects of different polarizing orientations of the linearly polarized incident light on the generation of uniform nanostructures have been investigated by the finite-difference time-domain (FDTD) method. Numerical simulation results show that 1D and/or 2D tunable nanostructures with resolutions beyond diffraction limit can be obtained by controlling the polarizing orientation of the incident light.

Paper Details

Date Published: 15 October 2012
PDF: 6 pages
Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 841814 (15 October 2012); doi: 10.1117/12.977310
Show Author Affiliations
Wei Xiao, Soochow Univ. (China)
Chinhua Wang, Soochow Univ. (China)
Genhua Chen, Soochow Univ. (China)
Fuyang Xu, Soochow Univ. (China)
Yimin Lou, Soochow Univ. (China)
Bing Cao, Soochow Univ. (China)
Guiju Zhang, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 8418:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems
Tianchun Ye; Song Hu; Yanqiu Li; Xiangang Luo; Xiaoyi Bao, Editor(s)

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