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Proceedings Paper

Performance of low dark current InGaAs shortwave infrared detector
Author(s): Tao Li; Ji-feng Cheng; Xiu-mei Shao; Hong-hai Deng; Yu Chen; Heng-jing Tang; Xue Li; Hai-mei Gong
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Paper Abstract

InxGa1-xAs ternary compound is suitable for detector applications in the shortwave infrared (1-3 μm) band. The alloy In0.53Ga0.47As is lattice-matched to InP substrate, which leads to high quality epitaxial layers. Consistently the In0.53Ga0.47As detector shows low dark current density and high detectivity at room temperature with wavelength response between 0.9 and 1.7 μm. In this paper, planar-type 24×1 linear InGaAs detector arrays with guard-ring structure were designed and fabricated based on n-i-n+ type InP/In0.53Ga0.47As/InP epitaxial structure by sealed-ampoule diffusion method. At first the dark current density is about 30~60 nA/cm2 at -0.1 V at room temperature. After modifications to the detector design and processing, the dark current density reduces to 2~9 nA/cm2 at -0.1 V at 293 K. The ideality factors simulated from I-V curves come close to 1 and less than the factors of previous detectors, which indicates that the dark current is dominated by diffusion current, while the generation-recombination current exhibits in the previous detectors. At the temperature of 293 K, the R0A of the detector reaches more than 1×107 Ω·cm2, the relative spectral response is in the range of 0.9 μm to 1.68 μm, the mean peak responsivity is 1.2 A/W and the mean peak detectivity is more than 3.0×1012 cm·Hz1/2/W.

Paper Details

Date Published: 15 October 2012
PDF: 6 pages
Proc. SPIE 8419, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing, Imaging, and Solar Energy, 841907 (15 October 2012); doi: 10.1117/12.977229
Show Author Affiliations
Tao Li, Shanghai Institute of Technical Physics (China)
Ji-feng Cheng, Shanghai Institute of Technical Physics (China)
Xiu-mei Shao, Shanghai Institute of Technical Physics (China)
Hong-hai Deng, Shanghai Institute of Technical Physics (China)
Yu Chen, Shanghai Institute of Technical Physics (China)
Heng-jing Tang, Shanghai Institute of Technical Physics (China)
Xue Li, Shanghai Institute of Technical Physics (China)
Hai-mei Gong, Shanghai Institute of Technical Physics (China)


Published in SPIE Proceedings Vol. 8419:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing, Imaging, and Solar Energy
Yadong Jiang; Junsheng Yu; Zhifeng Wang, Editor(s)

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