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Proceedings Paper

Conductive layer for charge dissipation during electron-beam exposures
Author(s): Luisa D. Bozano; Ratnam Sooriyakumaran; Takayuki Nagasawa; Satoshi Watanabe; Yoshio Kawai; Shinpei Kondo; Jun Kotani; Masayuki Kagawa; Linda K. Sundberg; Martha I. Sanchez; Elizabeth M. Lofano; Charles T. Rettner; Tasuku Senna; Thomas Faure
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Paper Abstract

Electron beam resists develop a surface potential during exposure that can lead to image placement errors of up to several nanometers [1] and cause poor CD uniformity and image quality. To address this problem, we have formulated a conductive polymer that can be coated onto the resist. Our conductive discharge layer (CDL) is water soluble and it is easily removed during subsequent processing steps. We have established that our material has low enough resistance for full charge dissipation during e-beam exposure and have carried out extensive tests to evaluate the impact of the layer on lithographic performance. We will report these findings, which include measurements of the effect of the CDL application on resist resolution, contrast, speed, and roughness on both wafer and on mask.

Paper Details

Date Published: 8 November 2012
PDF: 8 pages
Proc. SPIE 8522, Photomask Technology 2012, 85220O (8 November 2012); doi: 10.1117/12.977181
Show Author Affiliations
Luisa D. Bozano, IBM Almaden Research Ctr. (United States)
Ratnam Sooriyakumaran, IBM Almaden Research Ctr. (United States)
Takayuki Nagasawa, Shin-Etsu Chemical Co., Ltd. (Japan)
Satoshi Watanabe, Shin-Etsu Chemical Co., Ltd. (Japan)
Yoshio Kawai, Shin-Etsu Chemical Co., Ltd. (Japan)
Shinpei Kondo, Toppan Printing Co., Ltd. (Japan)
Jun Kotani, Toppan Printing Co., Ltd. (Japan)
Masayuki Kagawa, Toppan Printing Co., Ltd. (Japan)
Linda K. Sundberg, IBM Almaden Research Ctr. (United States)
Martha I. Sanchez, IBM Almaden Research Ctr. (United States)
Elizabeth M. Lofano, IBM Almaden Research Ctr. (United States)
Charles T. Rettner, IBM Almaden Research Ctr. (United States)
Tasuku Senna, Toppan Photomasks, Inc. (United States)
Thomas Faure, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 8522:
Photomask Technology 2012
Frank E. Abboud; Thomas B. Faure, Editor(s)

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