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Proceedings Paper

A new approach in dry technology for non-degrading optical and EUV mask cleaning
Author(s): Ivin Varghese; Ben Smith; Mehdi Balooch; Chuck Bowers
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Paper Abstract

The Eco‐Snow Systems group of RAVE N.P., Inc. has developed a new cleaning technique to target several of the advanced and next generation mask clean challenges. This new technique, especially when combined with Eco‐Snow Systems cryogenic CO2 cleaning technology, provides several advantages over existing methods because it: 1) is solely based on dry technique without requiring additional complementary aggressive wet chemistries that degrade the mask, 2) operates at atmospheric pressure and therefore avoids expensive and complicated equipment associated with vacuum systems, 3) generates ultra‐clean reactants eliminating possible byproduct adders, 4) can be applied locally for site specific cleaning without exposing the rest of the mask or can be used to clean the entire mask, 5) removes organic as well as inorganic particulates and film contaminations, and 6) complements current techniques utilized for cleaning of advanced masks such as reduced chemistry wet cleans. In this paper, we shall present examples demonstrating the capability of this new technique for removal of pellicle glue residues and for critical removal of carbon contamination on EUV masks.

Paper Details

Date Published: 8 November 2012
PDF: 6 pages
Proc. SPIE 8522, Photomask Technology 2012, 852218 (8 November 2012); doi: 10.1117/12.976889
Show Author Affiliations
Ivin Varghese, Eco-Snow Systems, Rave N.P. Inc. (United States)
Ben Smith, Eco-Snow Systems, Rave N.P. Inc. (United States)
Mehdi Balooch, Eco-Snow Systems, Rave N.P. Inc. (United States)
Chuck Bowers, Eco-Snow Systems, Rave N.P. Inc. (United States)


Published in SPIE Proceedings Vol. 8522:
Photomask Technology 2012
Frank E. Abboud; Thomas B. Faure, Editor(s)

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