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Proceedings Paper

Effect of the edge roughness of the pinhole in point diffraction interferometer on light diffraction
Author(s): Zengxiong Lu; Chunshui Jin; Dongmei Ma; Haitao Zhang
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Paper Abstract

The quality of the reference wave front in point diffraction interferometer (PDI) is mainly determined by pinhole diameter, pinhole edge roughness and so on. The edge roughness of an actually electric beam etched pinhole is determined by least square fitting method. The Gaussian noise with zero means and σ root mean square (RMS) is added to a perfect pinhole to model the edge roughness pinhole. Based on Rayleigh-Sommegeld diffraction formula, the quality of the far field wave front diffracted by a rough edge pinhole is analyzed in detail. Pinhole edge roughness mainly causes trefoil and coma aberrations in diffracted wave front. For pinholes with diameters from 400 nm to 1000 nm, when the edge roughness σ are 0 nm, 15 nm and 30 nm, the RMS deviation of the diffracted wave fronts are in the order of 10-8 λ, 10-4 λ and 10-3 λ, respectively. The results show that pinhole edge roughness has a significance infection on wave front errors, while it has little to do with the intensity distribution in the diffracted wave front. The edge roughness of the reality pinhole used in PDI is 2.37 nm, and the wave front errors of the wave front diffracted from this pinhole can reach 0.08 nm RMS.

Paper Details

Date Published: 2 July 2013
PDF: 6 pages
Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84180H (2 July 2013); doi: 10.1117/12.976875
Show Author Affiliations
Zengxiong Lu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate Univ. of Chinese Academy of Sciences (China)
Chunshui Jin, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Dongmei Ma, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Haitao Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 8418:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems
Tianchun Ye; Song Hu; Yanqiu Li; Xiangang Luo; Xiaoyi Bao, Editor(s)

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