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Proceedings Paper

Study of the Durability of the Ru-capped MoSi Multilayer Surface Under Megasonic cleaning
Author(s): Hüseyin Kurtuldu; Abbas Rastegar; Matthew House
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Paper Abstract

Because EUV masks lack of a pellicle, they are prone to particle contamination and must be cleaned frequently. Despite the relatively good resistance of the TaN absorber lines to pattern damage by megasonic cleaning, the Ru cap can be easily damaged by it. We demonstrate that the type and concentration of the dissolved gas are critical factors in determining the cavitation that eventually introduces pits on the surface of Ru-capped multilayer films. In particular, oxygen creates many more pits than CO2 under similar conditions. In this paper, we present the results of SEMATECH’s extensive experimental studies of pit creation on Ru-capped multilayer EUV blanks by megasonics as a function of acoustic field power, gas type and concentration in ultra-pure water, and chemicals during sonication.

Paper Details

Date Published: 8 November 2012
PDF: 8 pages
Proc. SPIE 8522, Photomask Technology 2012, 85221Q (8 November 2012); doi: 10.1117/12.976857
Show Author Affiliations
Hüseyin Kurtuldu, SEMATECH (United States)
Abbas Rastegar, SEMATECH (United States)
Matthew House, SEMATECH (United States)


Published in SPIE Proceedings Vol. 8522:
Photomask Technology 2012
Frank E. Abboud; Thomas B. Faure, Editor(s)

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