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Proceedings Paper

Ion beam sputtered Y2O3
Author(s): D. Patel; P. F. Langston; L. M. Imbler; L. A. Emmert; A. S. Markosyan; R. Route; M. M Fejer; W. Rudolph; C. S. Menoni
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Paper Abstract

We have investigated the ion beam sputtering (IBS) of Y2O3 as an alternative to HfO2 for high index layers in interference coatings for high power lasers. We present results on structural and optical properties of Y2O3 deposited from an oxide target. The IBS Y2O3 films are amorphous with a surface roughness of <6 Å for λ/4 thickness at 1 μm. The Y2O3 films are transparent with extremely low absorption loss at 1 μm and laser damage is in the range 10 J/cm2 when tested at a wavelength of 1.03 μm and pulse duration of 375 ps.

Paper Details

Date Published: 4 December 2012
PDF: 5 pages
Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85300Z (4 December 2012); doi: 10.1117/12.976808
Show Author Affiliations
D. Patel, Colorado State Univ., Fort Collins (United States)
P. F. Langston, Colorado State Univ., Fort Collins (United States)
L. M. Imbler, Colorado State Univ., Fort Collins (United States)
L. A. Emmert, The Univ. of New Mexico (United States)
A. S. Markosyan, Stanford Univ. (United States)
R. Route, Stanford Univ. (United States)
M. M Fejer, Stanford Univ. (United States)
W. Rudolph, The Univ. of New Mexico (United States)
C. S. Menoni, Colorado State Univ., Fort Collins (United States)


Published in SPIE Proceedings Vol. 8530:
Laser-Induced Damage in Optical Materials: 2012
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M J Soileau, Editor(s)

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