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Proceedings Paper

Anti-reflection coating on calcium fluoride substrate using ion-assisted deposition
Author(s): Yao-ping Zhang; Jun-qi Fan; Hong Xu
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Paper Abstract

The IR AR coating is of great importance in contemporary optics industry, thus in this theme we investigate deposition processes of anti-reflection coatings on calcium fluoride substrate using ion-assisted deposition, including single layer of ZnSYbF3 and a multilayer coating of AR. These thin films are produced by thermal evaporation using ion-assisted deposition, and with their optical characteristics measured and calculated, we analyzed the influence of ion source parameters on coatings such as anode voltage, anode current, argon flow, and so on. Based on research upon, we finally put forward the appropriate parameters to deposition antireflection coating on calcium fluoride substrate, in which the anode voltage and anode current play important roles in influencing the index of refraction and extinction coefficient of single layer of ZnS and YbF3 coatings in the infrared wavelength. Moreover, because of the ambient moisture, the anti-reflection coating deposition only work for ZnS and YbF3, but a Y2O3 layer can be added to protect the anti-reflection coating. In the end, we measured the coating with spectrometer and find out its average transmission reached 99.8%, which can satisfy the practical requirement.

Paper Details

Date Published: 16 October 2012
PDF: 5 pages
Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84161Q (16 October 2012); doi: 10.1117/12.976048
Show Author Affiliations
Yao-ping Zhang, Institute of Optics and Electronics (China)
Jun-qi Fan, Institute of Optics and Electronics (China)
Hong Xu, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 8416:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)

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