Share Email Print
cover

Proceedings Paper

Aging effect of optical properties on SiO2 films grown on Si substrates by ion beam sputtering
Author(s): Yiqin Ji; Huasong Liu; Yugang Jiang; Dandan Liu; Lishuan Wang; Chenghui Jiang; Rongwei Fan; Deying Chen
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

SiO2 is a very important low refractive index material and usually used in combination with high refractive index material to manufacture the coatings with low optical loss. In this paper, SiO2 films were deposited on Si substrates by an ion beam sputtering (IBS) technique and SiO2 target with purity of 99.99% was used as SiO2 thin films forming material. The thickness of SiO2 films grown onto Si substrates are about 900 nm. Aging optical properties of SiO2 films were investigated as a function of time placed in the air. Spectroscopic ellipsometry was used to measure optical constants of SiO2 films. The refractive index of SiO2 films change with the increase of placed time. When the placed time reaches more than 200 days, the value of refractive index tends to be constant and the corresponding variation rate is about 0.5%. As the placed time increases, the physical thickness and optical thickness also drive to be stabilization. It can be seen that optical properties of SiO2 films prepared by IBS technique under some process parameters are very stability.

Paper Details

Date Published: 16 October 2012
PDF: 5 pages
Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84161F (16 October 2012); doi: 10.1117/12.975934
Show Author Affiliations
Yiqin Ji, Harbin Institute of Technology (China)
Tianjin Jinhang Institute of Technical Physics (China)
Huasong Liu, Tianjin Jinhang Institute of Technical Physics (China)
Yugang Jiang, Tianjin Jinhang Institute of Technical Physics (China)
Tongji Univ. (China)
Dandan Liu, Tianjin Jinhang Institute of Technical Physics (China)
Lishuan Wang, Tianjin Jinhang Institute of Technical Physics (China)
Chenghui Jiang, Tianjin Jinhang Institute of Technical Physics (China)
Rongwei Fan, Harbin Institute of Technology (China)
Deying Chen, Harbin Institute of Technology (China)


Published in SPIE Proceedings Vol. 8416:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)

© SPIE. Terms of Use
Back to Top