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Proceedings Paper

Analysis to the measurement error on the index homogeneity of optical material
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Paper Abstract

In order to get three-dimensional distribution of the optical material which has very high index homogeneity, measuring index homogeneity of the main direction of a sample, then opening a rectangle window in the sample to measure the index homogeneity of the window direction. Zernike circle polynomials are in widespread use for wavefront analysis because of their orthogonality over a circular pupil and their representation of balanced classical aberrations, for the main direction is circular, we use the Zernike circle polynomials to fit the main direction interferometric data. From result of fitting the main direction interferometric data, we find the measuring error which must be taken into account. So it is an important question how to choose the orthonormal polynomial for fitting the window direction interferometric data. Using the Zernike circle polynomials as the basis functions, the orthonormal polynomials of the rectangular pupil be obtained from the circle polynomials by the Gram–Schmidt orthogonalization process, using the first fifteen items of the orthonormal polynomials of the rectangular pupil fit the interferometric data of the window direction, we get a good fitting precision, find the measuring error of some samples considerable at the same.

Paper Details

Date Published: 15 October 2012
PDF: 10 pages
Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84173G (15 October 2012); doi: 10.1117/12.975921
Show Author Affiliations
Zhiyuan Liao, Institute of Optics and Electronics (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Tingwen Xing, Institute of Optics and Electronics (China)
Zhixiang Liu, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 8417:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Libin Xiang; Sandy To, Editor(s)

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