Share Email Print

Proceedings Paper

Novel programmed defect mask blanks for ML defect understanding and characterization
Author(s): Kazuaki Matsui; Takagi Noriaki; Isogawa Takeshi; Yutaka Kodera; Sakata Yo; Akima Shinji
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

EUV blank inspection is the key technology for EUV mask fabrication. To assess blank inspection tools, it is important to obtain appropriate test blanks with properly characterized defect types. In this study, new programmed defect blank was fabricated with conventional programmed defect fabrication and several new methods for natural-like programmed defects. And defect characterization work has been conducted to verify the difference of conventional programmed defects and natural-like programmed defects, and confirmed wide range of defect sizes from minimum below 1nm-height × 18nm-width to micron order defects were successfully fabricated. Furthermore, the blank was inspected by Actinic Blank Inspection (ABI) tool and evaluated the effectiveness of the new defect fabrication methods. And it was confirmed that the new programmed defect showed similar characteristics as natural defects.

Paper Details

Date Published: 29 June 2012
PDF: 8 pages
Proc. SPIE 8441, Photomask and Next-Generation Lithography Mask Technology XIX, 84411A (29 June 2012); doi: 10.1117/12.975824
Show Author Affiliations
Kazuaki Matsui, Toppan Printing Co., Ltd., (Japan)
Takagi Noriaki, EUVL Infrastructure Development Ctr. Inc. (Japan)
Isogawa Takeshi, Toppan Printing Co., Ltd., (Japan)
Yutaka Kodera, Toppan Printing Co., Ltd., (Japan)
Sakata Yo, Toppan Printing Co., Ltd., (Japan)
Akima Shinji, Toppan Printing Co., Ltd., (Japan)

Published in SPIE Proceedings Vol. 8441:
Photomask and Next-Generation Lithography Mask Technology XIX
Kokoro Kato, Editor(s)

© SPIE. Terms of Use
Back to Top