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Proceedings Paper

Research progress of wavefront aberration metrology equipment of lithography projection lens
Author(s): Changsong Yu; Yang Xiang
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Paper Abstract

The wavefront aberration of lithography projection lens is very important performance parameter. High-accuracy interferometer is a cornerstone requirement for the success of projection lithography lens. Recent development of the international high-accuracy wavefront aberration metrology technology of projection lens is described. Several high-accuracy measurement methods based on phase measurement interferometry (PMI) principle of lens wavefront aberrations are analyzed and compared and the merits and demerits of these measurement methods are also discussed. The dominating test technology types of mainstream companies and research organizations as well as their performance parameters are reviewed. Moreover, the performance and key technologies of point diffraction interferometer (PDI) and lateral shearing interferometer (LSI) are emphatically analyzed. Finally, the trend of high-precision system wavefront aberration test technique is described.

Paper Details

Date Published: 15 October 2012
PDF: 5 pages
Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84173W (15 October 2012); doi: 10.1117/12.975809
Show Author Affiliations
Changsong Yu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Yang Xiang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 8417:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Libin Xiang; Sandy To, Editor(s)

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