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Proceedings Paper

Research on method of measuring pattern distortion of circularly symmetrical phase etched CGHs and eliminating the effect of pattern distortion
Author(s): Chao Deng; Jie Feng; Tingwen Xing
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Paper Abstract

Circularly symmetrical phase etched computer-generated hologram (CGH) are widely used to test aspheric surface. In CGH fabrication errors, pattern distortion errors not only strongly affect the test precision but also can’t be facilely eliminated. In order to improve the test accuracy of system, a moiré fringes method is described for testing circularly symmetrical pattern distortion. Compared with the conventional method of using microdensitometer, the new method is more accurate and quicker for measuring the pattern distortion. Then, based on the accurate measurement of CGH pattern distortion, the impact on test accuracy that pattern distortion brings is eliminated with synthetic wavefront error map. Finally, through computer simulating, it is proved that the new method can effectively reduce the impact on test accuracy that pattern distortion brings.

Paper Details

Date Published: 15 October 2012
PDF: 10 pages
Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84180V (15 October 2012); doi: 10.1117/12.975793
Show Author Affiliations
Chao Deng, Institute of Optics and Electronics (China)
Jie Feng, Institute of Optics and Electronics (China)
Graduate Univ. of Chinese Academy of Sciences (China)
Tingwen Xing, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 8418:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems
Tianchun Ye; Song Hu; Yanqiu Li; Xiangang Luo; Xiaoyi Bao, Editor(s)

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