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Proceedings Paper

High performance narrow band-pass filter for the NIR/MWIR range
Author(s): Xian Jun Su; Wei Wu; Kai Yan; Feng Jin Chen; Chao Meng
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Paper Abstract

High performance narrow band-pass filter(NBF) designed for dual-band infrared(IR) detectors of near-infrared(NIR) and mid-wavelength infrared(MWIR) application is presented. As the part of dual-color filters, the filter features a high transmittance at the center wavelength of 1.55μm and a broadband rejection out of the pass band from 1 to 5μm. The pass band need to be centered in 1.55±0.03μm, have a full width at half maximum of less than 0.055μm and maximum transmittance higher than 75% when measured at normal incidence. Thin-film design for the filters is investigated in detail and two kinds of multilayer schemes are obtained by computer optimization. Both consist of a fundamental narrow-band filter of Fabry-Perot cavity with Si/SiO2 and Ti3O5/SiO2 as the material pair, respectively, and three edge filters with the material pair of Si/SiO2 for wide band rejection. Moreover, the preparation of the filters have been given, including the deposition parameters and especially, the optical thickness monitoring of the stack of Fabry-Perot cavity. Finally, the filters meeting the requirements are accomplished and characterized, which have the peak transmittance of about 82%, a full width at half maximum of 0.050μm and a broadband rejection with the average transmittance lower than 1% from 1 to 5μm.

Paper Details

Date Published: 16 October 2012
PDF: 6 pages
Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84160M (16 October 2012); doi: 10.1117/12.975755
Show Author Affiliations
Xian Jun Su, LuoYang Optoelectro Technology Development Ctr. (China)
Wei Wu, LuoYang Optoelectro Technology Development Ctr. (China)
Kai Yan, LuoYang Optoelectro Technology Development Ctr. (China)
Feng Jin Chen, LuoYang Optoelectro Technology Development Ctr. (China)
Chao Meng, LuoYang Optoelectro Technology Development Ctr. (China)


Published in SPIE Proceedings Vol. 8416:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)

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