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Proceedings Paper

A Contrast Enhanced Reflectionless Process (CER)
Author(s): J. Ch. Guibert; M. Chevallier
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Paper Abstract

A new multilayer resist system for lithography has been developed for VLSI production with submicron geometries. Antireflective coating is used in combination with a novolac resist and a Contrast Enhancement Material. The characteristics of this system, along with its advantages, disadvantages and results are discussed for its use over critical levels.

Paper Details

Date Published: 17 September 1987
PDF: 9 pages
Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); doi: 10.1117/12.975612
Show Author Affiliations
J. Ch. Guibert, Commissariat a l'Enerqie Atomique (France)
M. Chevallier, Commissariat a l'Enerqie Atomique (France)


Published in SPIE Proceedings Vol. 0811:
Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection
Harry L. Stover; Stefan Wittekoek, Editor(s)

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