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Proceedings Paper

Bilevel System HPR/PMMA
Author(s): Andre P. Weill; Elisabeth C. Dechenaux; Patrick J. Paniez; Gilles R. Amblard
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Paper Abstract

A two layers HPR/PMMA lithographic process is developped in order to overcome the limitations of the single layer scheme when over aluminium steps. Results of PMMA coating and step coverage, HPR patterning, descum of the interfacial layer, image development are presented and discussed in terms of material properties.

Paper Details

Date Published: 17 September 1987
PDF: 10 pages
Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); doi: 10.1117/12.975608
Show Author Affiliations
Andre P. Weill, Centre National d'Etudes des Telecommunications (France)
Elisabeth C. Dechenaux, Centre National d'Etudes des Telecommunications (France)
Patrick J. Paniez, Centre National d'Etudes des Telecommunications (France)
Gilles R. Amblard, Centre National d'Etudes des Telecommunications (France)


Published in SPIE Proceedings Vol. 0811:
Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection
Harry L. Stover; Stefan Wittekoek, Editor(s)

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