Share Email Print
cover

Proceedings Paper

An Advanced Wafer Stepper For Sub-Micron Fabrication
Author(s): Herbert E. Mayer; Ernst W. Loebach
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

An advanced wafer stepper is presented addressing the specific problems involved by sub-micron lithography such as alignment and focusing to multilayer resist films. New sub-systems were developed while maintaining principles well proven in a previous design. The system is described emphasizing the new sub-systems, and performance data are presented.

Paper Details

Date Published: 17 September 1987
PDF: 13 pages
Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); doi: 10.1117/12.975607
Show Author Affiliations
Herbert E. Mayer, PERKIN-ELMER CENSOR Anstalt (Switzerland)
Ernst W. Loebach, PERKIN-ELMER CENSOR Anstalt (Switzerland)


Published in SPIE Proceedings Vol. 0811:
Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection
Harry L. Stover; Stefan Wittekoek, Editor(s)

© SPIE. Terms of Use
Back to Top