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Proceedings Paper

An Advanced Wafer Stepper For Sub-Micron Fabrication
Author(s): Herbert E. Mayer; Ernst W. Loebach
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Paper Abstract

An advanced wafer stepper is presented addressing the specific problems involved by sub-micron lithography such as alignment and focusing to multilayer resist films. New sub-systems were developed while maintaining principles well proven in a previous design. The system is described emphasizing the new sub-systems, and performance data are presented.

Paper Details

Date Published: 17 September 1987
PDF: 13 pages
Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); doi: 10.1117/12.975607
Show Author Affiliations
Herbert E. Mayer, PERKIN-ELMER CENSOR Anstalt (Switzerland)
Ernst W. Loebach, PERKIN-ELMER CENSOR Anstalt (Switzerland)


Published in SPIE Proceedings Vol. 0811:
Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection
Harry L. Stover; Stefan Wittekoek, Editor(s)

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