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Proceedings Paper

Advances In 1:1 Optical Lithography
Author(s): Adonis C. Stephanakis; Daniel I. Rubin; Ron Voisin
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Paper Abstract

Numerous advancements based on the inherent simplicity and excellent optical correction of 1:1 broadband stepper lenses have occurred over the past year. This paper briefly touches on the lithographic requirements of various segments of the semiconductor industry and describes photolithographic developments that meet many of these requirements.

Paper Details

Date Published: 17 September 1987
PDF: 12 pages
Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); doi: 10.1117/12.975606
Show Author Affiliations
Adonis C. Stephanakis, Ultratech Stepper (United States)
Daniel I. Rubin, Ultratech Stepper (United States)
Ron Voisin, Ultratech Stepper (United States)


Published in SPIE Proceedings Vol. 0811:
Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection
Harry L. Stover; Stefan Wittekoek, Editor(s)

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