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Proceedings Paper

Interference Microscopy Of Surface Relief Structures
Author(s): D. M. Gale; M. I. Pether; F. C. Reavell
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Paper Abstract

A high resolution Linnik interference microscope has been constructed to record one dimensional phase and intensity images of line structures on integrated circuit wafers. The phase is measured by recording three interferograms with differing phases of the reference beam with respect to the object beam. Experimental results are presented for two test structures. Images obtained from the microscope are compared with those predicted by a theoretical model of image formation.

Paper Details

Date Published: 17 September 1987
PDF: 8 pages
Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); doi: 10.1117/12.975595
Show Author Affiliations
D. M. Gale, Imperial College Of Science And Technology (United Kingdom)
M. I. Pether, Imperial College Of Science And Technology (United Kingdom)
F. C. Reavell, Imperial College Of Science And Technology (United Kingdom)


Published in SPIE Proceedings Vol. 0811:
Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection
Harry L. Stover; Stefan Wittekoek, Editor(s)

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