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Proceedings Paper

Detailed Model Of HF-DF Chemical Lasers
Author(s): D. L. Bullock; M. M. Valley; R. J. Wagner; M. E. Lainhart; R. S. Margulies
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Paper Abstract

A model of HF-DF chemical lasers which includes a wave optics treatment of the resonator, a flowing gain medium, all important gas phase kinetics processes, and rotational non-equilibrium is discussed. The effects of rotational cross-relaxation rate on the predicted spectra for both stable and unstable resonators are shown, as well as the interaction of this effect with the placement of the resonator optical axis within the mode. The effect of partial aperture lasing and means for its suppression using cross-relaxation rate and/or optical axis placement are discussed. Some comparison with experiment is presented.

Paper Details

Date Published: 25 November 1986
PDF: 8 pages
Proc. SPIE 0642, Modeling and Simulation of Optoelectronic Systems, (25 November 1986); doi: 10.1117/12.975476
Show Author Affiliations
D. L. Bullock, TRW (United States)
M. M. Valley, TRW (United States)
R. J. Wagner, TRW (United States)
M. E. Lainhart, TRW (United States)
R. S. Margulies, TRW (United States)


Published in SPIE Proceedings Vol. 0642:
Modeling and Simulation of Optoelectronic Systems
John Dugan O'Keefe, Editor(s)

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