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Proceedings Paper

Insights into effects of thermal annealing on optical properties of SiO2 films
Author(s): Yugang Jiang; Yiqin Ji; Huasong Liu; Dandan Liu; Lishuan Wang; Chenghui Jiang; Yaping Yang; Deying Chen
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Paper Abstract

Annealing is an important method to alter the properties of thin films. The effects of thermal treatment in air on optical properties of SiO2 thin films were investigated. SiO2 thin films were deposited on Si (110) substrates by an ion beam sputtering (IBS) technique, and then annealed in air under different thermal annealing time of 16 hours, 24 hours, 36 hours, 64 hours and the temperature from 100℃ to 600℃ with 24 hours. Optical properties refractive index and thickness are studied directly after deposition and after thermal treatment, and they are measured by spectroscopic ellipsometry. When the thermal annealing temperature was fixed at 300℃, the refractive index of SiO2 films would reduce with the increase of the thermal annealing time, the optical thickness also reduced but the various quantities are almost the same. The refractive index of SiO2 films changed with the different thermal annealing temperature. As the annealing temperature increased, the refractive index of SiO2 films reduced gradually. When the selected annealing temperature is 500℃, the refractive index of SiO2 films reached minimum. It can be found that the optical properties of SiO2 thin films can be improved by an adapted annealing procedure.

Paper Details

Date Published: 16 October 2012
PDF: 5 pages
Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84160F (16 October 2012); doi: 10.1117/12.974980
Show Author Affiliations
Yugang Jiang, Tongji Univ. (China)
Tianjin Jinhang Institute of Technical Physics (China)
Yiqin Ji, Tianjin Jinhang Institute of Technical Physics (China)
Harbin Institute of Technology (China)
Huasong Liu, Tianjin Jinhang Institute of Technical Physics (China)
Dandan Liu, Tianjin Jinhang Institute of Technical Physics (China)
Lishuan Wang, Tianjin Jinhang Institute of Technical Physics (China)
Chenghui Jiang, Tianjin Jinhang Institute of Technical Physics (China)
Yaping Yang, Tongji Univ. (China)
Deying Chen, Harbin Institute of Technology (China)


Published in SPIE Proceedings Vol. 8416:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)

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