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Proceedings Paper

The analysis of layout and correction performance of adaptive optics system based on bimorph deformable mirror
Author(s): Fei Xiao; Yudong Zhang; Dai Yun; Zhou Hong
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Paper Abstract

Wavefront sensor and wavefront corrector are two important parts of adaptive optics (AO) systems, which must match well in order to achieve optimal aberration correction performance. In this paper, for a selected 35-elemenet bimorph deformable mirror, which is made by Institute of Optics and Electronics (IOE), Shack-Hartmann wavefront sensors are designed and analyzed with two different layouts, square layout and annular layout. A simulation model is established to evaluate the correction performance of the system. Within each layout, wavefront sensors with different number of subapertures are compared and analyzed. The best matching Shack-Hartmann wavefront sensor design is obtained by minimizing the condition number and wavefront correction error. The results show that higher correction performance can be achieved with square configuration and there is an optimal subaperture number for this selected deformable mirror.

Paper Details

Date Published: 15 October 2012
PDF: 6 pages
Proc. SPIE 8419, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing, Imaging, and Solar Energy, 84191P (15 October 2012); doi: 10.1117/12.974316
Show Author Affiliations
Fei Xiao, Institute of Optics and Electronics (China)
Key Lab. on Adaptive Optics (China)
Graduate Univ. of Chinese Academy of Sciences (China)
Yudong Zhang, Institute of Optics and Electronics (China)
Key Lab. on Adaptive Optics (China)
Dai Yun, Institute of Optics and Electronics (China)
Key Lab. on Adaptive Optics (China)
Zhou Hong, Institute of Optics and Electronics (China)
Key Lab. on Adaptive Optics (China)


Published in SPIE Proceedings Vol. 8419:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing, Imaging, and Solar Energy
Yadong Jiang; Junsheng Yu; Zhifeng Wang, Editor(s)

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