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Proceedings Paper

High precision calibration for 2D optical standard
Author(s): Shuanghua Sun; Xiaochuan Gan; Zi Xue; Xiaoyou Ye; Heyan Wang; Hongtang Gao
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Paper Abstract

Photomask is a kind of 2-D optical standard with etched orthogonal coordinates made of a glass substrate chrominged or filmed with other metal. In order to solve the problems of measurement and traceability of ultra precision photomasks used in advanced manufacturing industry, 2-D photomask optical standard was calibrated in high precision laser two coordinate standard device. A high precision differential laser interferometer system was used for a length standard, a high magnification optical micro vision system was used for precision optical positioning feedback. In this paper, a image measurement model was purposed; A sampling window auto identification algorithm was designed. Grid stripe image could be identified and aimed at automatically by this algorithm. An edge detection method based on bidirection progressive scanning and 3-sigma rule for eliminating outliers in sampling window was found. Dirty point could be removed with effect. Edge detection error could be lowered. By this means, the measurement uncertainty of 2-D optical standard's ruling span was less than 0.3 micrometer (k=2).

Paper Details

Date Published: 15 October 2012
PDF: 6 pages
Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84172H (15 October 2012); doi: 10.1117/12.974263
Show Author Affiliations
Shuanghua Sun, National Institute of Metrology (China)
Xiaochuan Gan, National Institute of Metrology (China)
Zi Xue, National Institute of Metrology (China)
Xiaoyou Ye, National Institute of Metrology (China)
Heyan Wang, National Institute of Metrology (China)
Hongtang Gao, National Institute of Metrology (China)


Published in SPIE Proceedings Vol. 8417:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Libin Xiang; Sandy To, Editor(s)

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