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Proceedings Paper

Study on stray light suppression in IRFPA Dewar
Author(s): Wang Xia; Wen Sun; Xiaokun Wang; Yanjin Li
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Paper Abstract

The method of the stray light suppression in infrared focal plane array dewar is studied. Some purposes and several design principles of baffle vanes in cold shield are presented. Two configurations of cold shield are proposed to reduce the effect of stray light on the basis of the configuration of the original cylindrical cold shield. The effects of three configurations of cold shield on stray light suppression were simulated, compared and analyzed by using the TracePro software. According to the analyzing results, the two configurations of cold shield proposed are much better than the original one, and the effect of the cold shield with one baffle vane is close to the other cold shield with two baffle vanes. The three cold shield were manufactured and assembled in the same infrared focal plane array dewar to be test respectively. The test results are in accord with the simulation. On account of fine effect on the stay light suppression and simple making technology, the cold shied with one baffle vane is applied to dewar assembly. The effect of the stray light suppression and background radiation decrease is improved.

Paper Details

Date Published: 15 October 2012
PDF: 6 pages
Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84172I (15 October 2012); doi: 10.1117/12.973749
Show Author Affiliations
Wang Xia, Shanghai Institute of Technical Physics (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Wen Sun, Shanghai Institute of Technical Physics (China)
Xiaokun Wang, Shanghai Institute of Technical Physics (China)
Yanjin Li, Shanghai Institute of Technical Physics (China)


Published in SPIE Proceedings Vol. 8417:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Libin Xiang; Sandy To, Editor(s)

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