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Proceedings Paper

Synchronous control strategy of wafer and reticle stage of step and scan lithography
Author(s): Lanlan Li; Song Hu; Lixin Zhao; Ping Ma
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Paper Abstract

For step and scan lithography systems, the synchronization of reticle stage and wafer stage during exposure is one of the most important factors that decides the image quality. In this paper, their principle is analyzed through investigating the structure of step and scan lithography systems. And the coarse and fine laminated model is built. Based on this model, three different kinds of synchronous control structures containing parallel, series and cross-coupled are proposed. Then, the reticle stage is used to compensate the error of the synchronous control system of wafer and reticle stage. Simulation results demonstrate that this control strategy has good synchronization performance, and the synchronous error of wafer stage and reticle stage is less than 0.5nm without disturbance.

Paper Details

Date Published: 15 October 2012
PDF: 6 pages
Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84180M (15 October 2012); doi: 10.1117/12.971476
Show Author Affiliations
Lanlan Li, Institute of Optics and Electronics (China)
Graduate Univ. of Chinese Academy of Sciences (China)
Song Hu, Institute of Optics and Electronics (China)
Lixin Zhao, Institute of Optics and Electronics (China)
Ping Ma, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 8418:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems
Tianchun Ye; Song Hu; Yanqiu Li; Xiangang Luo; Xiaoyi Bao, Editor(s)

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