Share Email Print
cover

Proceedings Paper

Measurements of spectrum on HF chemical lasers with MOPA configuration
Author(s): Yu-bin Chen; Xing Chen; Wenguang Liu
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

HF chemical laser with master oscillator power amplifier (MOPA) configuration is a good solution to achieve high output power with high reliability and good beam quality. Researches of spectrum on HF chemical lasers with MOPA configuration are important for both enhancing atmospheric transmission and ensuring high power extraction efficiency on multiple vibrational transitions. A HF chemical laser operated in the line-selected mode which makes the output frequencies located in the atmospheric transparency windows will allow low atmospheric absorption, which will reduce thermal blooming effects and increase the intensity on the target. This will make the CW HF chemical lasers a possible development for long-distance transmission within the atmosphere. In this paper, a HF chemical laser with MOPA configuration using two identical discharge-driven CW HF laser modules as the laser oscillator and amplifier is presented. A multiple-selected-line, confocal, unstable resonator is also introduced. Measurements of spectrum on the laser have been taken by varying the flow parameters of the discharge-driven HF laser. It is concluded from our experiments that, the spectrum keeps stable with fixed flow parameters, even though the relative power of different lines varies slightly, and the maximum power is on the direct cascade of P2(7) and P1(8) lines. It is also believed that control of the flow parameters may allow high J direct cascade levels transitions, which may ensure high power extraction efficiency from multiple vibrational transitions.

Paper Details

Date Published: 15 October 2012
PDF: 6 pages
Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84173V (15 October 2012); doi: 10.1117/12.971470
Show Author Affiliations
Yu-bin Chen, National Univ. of Defense Technology (China)
Xing Chen, National Univ. of Defense Technology (China)
Wenguang Liu, National Univ. of Defense Technology (China)


Published in SPIE Proceedings Vol. 8417:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Libin Xiang; Sandy To, Editor(s)

© SPIE. Terms of Use
Back to Top