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Proceedings Paper

Technology of focus detection for 193nm projection lithographic tool
Author(s): Chengliang Di; Wei Yan; Song Hu; Feng Xu; Jinglong Li
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Paper Abstract

With the shortening printing wavelength and increasing numerical aperture of lithographic tool, the depth of focus(DOF) sees a rapidly drop down trend, reach a scale of several hundred nanometers while the repeatable accuracy of focusing and leveling must be one-tenth of DOF, approximately several dozen nanometers. For this feature, this article first introduces several focusing technology, Obtained the advantages and disadvantages of various methods by comparing. Then get the accuracy of dual-grating focusing method through theoretical calculation. And the dual-grating focusing method based on photoelastic modulation is divided into coarse focusing and precise focusing method to analyze, establishing image processing model of coarse focusing and photoelastic modulation model of accurate focusing. Finally, focusing algorithm is simulated with MATLAB. In conclusion dual-grating focusing method shows high precision, high efficiency and non-contact measurement of the focal plane, meeting the demands of focusing in 193nm projection lithography.

Paper Details

Date Published: 15 October 2012
PDF: 9 pages
Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84180Y (15 October 2012); doi: 10.1117/12.971448
Show Author Affiliations
Chengliang Di, Institute of Optics and Electronics (China)
Graduate Univ. of Chinese Academy of Sciences (China)
Wei Yan, Institute of Optics and Electronics (China)
Song Hu, Institute of Optics and Electronics (China)
Feng Xu, Institute of Optics and Electronics (China)
Graduate Univ. of Chinese Academy of Sciences (China)
Jinglong Li, Institute of Optics and Electronics (China)
Graduate Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 8418:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems
Tianchun Ye; Song Hu; Yanqiu Li; Xiangang Luo; Xiaoyi Bao, Editor(s)

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