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Proceedings Paper

Study on range selection of key parameters in bonnet polishing using FEA
Author(s): Ri Pan; Zhen-zhong Wang; Dong-xu Zhang; Chun-jin Wang; Yin-hui Xie; Yinbiao Guo
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Paper Abstract

Bonnet polishing system is mostly used in rough polishing and fine polishing because of its own features. Due to different aims of polishing stages, optimal ranges of key parameters are different in various polishing stages. Simulations in ANSYS are present in order to get optimal ranges of key parameters including inner pressure P and compression of bonnet H in different polishing stages, firstly, the reliability of simulation of bonnet polishing using ANSYS is verified through a series of simulation about fine polishing stage, on the condition of using ranges of key parameters got by former researchers from polishing experiment; secondly, simulations about rough polishing were carried out, and optimal ranges of key parameters were found, which have reference value in future work.

Paper Details

Date Published: 16 October 2012
PDF: 5 pages
Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 841613 (16 October 2012); doi: 10.1117/12.970530
Show Author Affiliations
Ri Pan, Xiamen Univ. (China)
Zhen-zhong Wang, Xiamen Univ. (China)
Dong-xu Zhang, Xiamen Univ. (China)
Chun-jin Wang, Xiamen Univ. (China)
Yin-hui Xie, Xiamen Univ. (China)
Yinbiao Guo, Xiamen Univ. (China)


Published in SPIE Proceedings Vol. 8416:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)

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