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Proceedings Paper

A perspective on collaborative research for emerging technologies and design
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Paper Abstract

A perspective is given using student projects on how university research can be an important resource for the highly advanced and sophisticated photomask industry. The collaborative and cross-discipline nature of innovation in the IC industry naturally leads to win-win relationships. Specific examples are given of successful collaborative research projects from the University of California consortium "Integrated Modeling Process and Computation for Technology" (IMPACT). The examples include research on lithography and inspection, devices, statistical characterization, and Design-for-Manufacturing frameworks for multiple-patterning and EUV. The paper concludes with a perspective on future opportunities, challenges and plans. The technical details of the student projects were published but not presented in connection with Photomask Japan 2011 (SPIE Proc. 8081).

Paper Details

Date Published: 30 June 2012
PDF: 4 pages
Proc. SPIE 8441, Photomask and Next-Generation Lithography Mask Technology XIX, 84410G (30 June 2012); doi: 10.1117/12.970297
Show Author Affiliations
Andrew R. Neureuther, Univ. of California, Berkeley (United States)

Published in SPIE Proceedings Vol. 8441:
Photomask and Next-Generation Lithography Mask Technology XIX
Kokoro Kato, Editor(s)

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