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Proceedings Paper

Applications of MRC software for efficient mask manufacturing
Author(s): Kokoro Kato; Yoshiyuki Taniguchi; Kuninori Nishizawa; Tadao Inoue
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Paper Abstract

Since the layout patterns on photomasks have been getting more and more complicated by OPC/RET processes, the mask patterns need to go through the verification to check the mask manufacturability even though the layout is 'DRC clean'. This verification process is called MRC (mask rule check). The fundamental functions required for MRC is relatively simple, such as narrow gap detection between patterns. SII NanoTechnology has been developing an MRC software product, SmartMRCTM, and it is widely used in mask shops as MRC standard software. Recently, in addition to typical usages of MRC software, various realistic applications have been reported in order to solve problems related to mask fabrication process. In this paper, we introduce three applications of MRC software for more efficient mask manufacturing.

Paper Details

Date Published: 30 June 2012
PDF: 7 pages
Proc. SPIE 8441, Photomask and Next-Generation Lithography Mask Technology XIX, 84411D (30 June 2012); doi: 10.1117/12.970256
Show Author Affiliations
Kokoro Kato, SII NanoTechnology Inc. (Japan)
Yoshiyuki Taniguchi, SII NanoTechnology Inc. (Japan)
Kuninori Nishizawa, SII NanoTechnology Inc. (Japan)
Tadao Inoue, SII NanoTechnology Inc. (Japan)


Published in SPIE Proceedings Vol. 8441:
Photomask and Next-Generation Lithography Mask Technology XIX
Kokoro Kato, Editor(s)

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