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Proceedings Paper

Resistance To Oxidation Of Te-Se Optical Recording Films
Author(s): Motoyasu Terao; Shinkichi Horigome; Kazuo Shigematsu; Yasushi Miyauchi; Masatoshi Nakazawa
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Paper Abstract

The resistance to oxidation and cracking of metal-Te-Se recording films and their mechanisms have been studied. The metals included In, Pb, Sn, Bi, and Sb. The films were deposited by multi-source, high-speed rotary evaporation on substrates with glass-U.V. light curing resin-cellulose nitrate or acetate structures. The role of Se is to inhibit the oxidation and the role of metallic elements are to inhibit cracking and to decrease noise in reproduced signals by making crystal grains smaller. Selection of substrate surface material, especially selection of U.V.light curing resin, is also important to avoid oxidation of the recording film. Depth profiles of the recording films have been analyzed by Auger electron spectroscopy and X-ray photoelectron spectroscopy to clarify the mechanisms of oxidation inhibition.

Paper Details

Date Published: 1 January 1983
PDF: 6 pages
Proc. SPIE 0382, Optical Data Storage, (1 January 1983); doi: 10.1117/12.970215
Show Author Affiliations
Motoyasu Terao, Hitachi Ltd. (Japan)
Shinkichi Horigome, Hitachi Ltd. (Japan)
Kazuo Shigematsu, Hitachi Ltd. (Japan)
Yasushi Miyauchi, Hitachi Ltd. (Japan)
Masatoshi Nakazawa, Hitachi Ltd. (Japan)


Published in SPIE Proceedings Vol. 0382:
Optical Data Storage
Di Chen, Editor(s)

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