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Proceedings Paper

Photolithographic Masks For Integrated Optic Circuits Fabricated With An Ar+ Laser System
Author(s): P. Boffi; O. De Pascale; C. Esposito; M. Gaudio; A. M. Losacco; M. Vilnio
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Paper Abstract

A computer-controlled Argon laser system for writing photolithographic masks over an area as large as 50 mm x 50 mm has been developed. Different waveguide patterns have been written and some field assisted ion-exchange channel waveguides have been fabricated directly into integrated circuit mask plates.

Paper Details

Date Published: 16 January 1988
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Proc. SPIE 0952, Laser Technologies in Industry, (16 January 1988); doi: 10.1117/12.968895
Show Author Affiliations
P. Boffi, Centro Laser s.r.l (Italy)
O. De Pascale, Centro Laser s.r.l (Italy)
C. Esposito, Centro Laser s.r.l (Italy)
M. Gaudio, Centro Laser s.r.l (Italy)
A. M. Losacco, Centro Laser s.r.l (Italy)
M. Vilnio, Centro Laser s.r.l (Italy)


Published in SPIE Proceedings Vol. 0952:
Laser Technologies in Industry

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